TEM Silicon Nitride Grids – 3×3 Windows

Description

Primary Application	Electron Microscopy
Secondary Applications	Cryo-EM, High-resolution EM, Sample Deposition
Material	Nanoporous Silicon Nitride, Silicon Nitride
Thickness	5 nm, 10 nm, 20 nm, 50 nm
Porosity	Nanoporous, Nonporous
Window Size	(8) 50×50 µm + (1) 50×100 µm, (8) 100×100 µm + (1) 100×350 µm, (8) 250×250 µm + (1) 250×500 µm
Pore Size	30 nm
Chip Frame	2.9 mm diameter + 0.1 mm thick, 2.9 mm hexagonal + 0.1 mm thick

Thickness	5nm, 10nm, 20nm, 50nm

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